Journals
Books
Articles by keyword etching
Investigation of Surface Structures in the Process of Manufacturing Langasite Y-Cut Piezoelements
A. M. Yarosh, O. V. Prokhorenko, S. V. Ermolenko
Ion-beam lithography in semiconductor technology of microwave microelectronics
V.V. Perinsky, V.N. Lyasnikov
Mesh structures for polarizing electromagnetic waves in THZ frequency range
S.A. Alaverdyan, S.I. Bokov, N.A. Zai-cev, V.M. Isaev, I.N. Kabanov, A.P. Krenitskiy, V.P. Meschanov
Application of Plasma-Chemical Etching for pin Diode Technology
O.R. Abdullaev - Pd. Sc. (Eng.), Director of Science and Production, JSC «Optron». E-mail: abd@optron.ru
E.S. Rogovskiy - Senior Engineer, JSC «Optron». E-mail: skb-optron@mail.ru
M.Yu. Filatov - Ph.D. (Eng.), Vice-Director of Design Department, JSC «Optron». E-mail: skb-optron@mail.ru
The precipitation of copper(+2) oxalate from spent solution of anodic aluminium oxidation and spent solutions of copper(+2)
E. G. Afonin - Ph.D. (Chem.), Senior Research Scientist, JSC «Kaluga Research Institute of Telemechanical Devices». E-mail: kniitmu@kaluga.net
Electrochemical synthesis of porous membranes based on nanostructured alumina
D.L. Shimanovitch - Senior Researcher, Byelorussian State University on Information and Radioelectronics
Composition of silicon-carbonic of domains on crystals of silicon (100)
V.Ya. Shanygin - Senior Engineer, Saratov branch of Kotelnikov IRE RAS. E-mail: vitairerun@mail.ru R.K. Yafarov - Dr.Sc. (Eng.), Head of Laboratory, Saratov branch of Kotelnikov IRE RAS S.Yu. Suzdaltsev - Ph.D. (Eng.), Senior Research Scientist, Saratov branch of Kotelnikov IRE RAS D.V. Nefedov - Ph.D. (Eng.), Research Scientist, Saratov branch of Kotelnikov IRE RAS
Thermoelastic martensitic transition and shape memory effect in Ti2NiCu alloy at micro- and nanoscale

P.V. Lega

Kotel’nikov Institute of Radioengineering and Electronics of RAS (Moscow, Russia)

Thermoelastic martensitic transition and shape memory effect in Ti2NiCu alloy at micro- and nanoscale

P.V. Lega1

1 Kotel’nikov Institute of Radioengineering and Electronics of RAS (Moscow, Russia)

Plasma-chemical etching of quartz glass by sulfur hexafluoride

G.R. Sagatelyan1, K.N. Bugorkov2, A.B. Solomashenko3, A.S. Kuznetsov4

1–4 Bauman Moscow State Technical University (National Research University) (Moscow, Russia)
 

Investigation of ion beams of the gridless ion sources with floating and anode potential of the discharge chamber rear wall

D.S. Manegin1, V.D. Sokolov2, S.O. Shilov3, E.V. Vorobev4, O.P. Plotnikova5, S.G. Ivakhnenko6

1-6 SEC «Ion Plasma Technologies», BMSTU (Moscow, Russia)

1 manegin@bmstu.ru; 2 sokolovvd@bmstu.ru; 3 s.shilov@bmstu.ru; 4 evv@bmstu.ru; 5 plotnikova@bmstu.ru; 6 ivakhnenko@bmstu.ru

Energy characteristics of the gridless ion sources beams

D.S. Manegin1, V.D. Sokolov2, O.P. Plotnikova3, E.V. Vorobev4, S.G. Ivakhnenko5

1-5 «SEC «Ion Plasma Technologies», BMSTU (Moscow, Russia)

1 manegin@bmstu.ru; 2 sokolovvd@bmstu.ru; 3 plotnikova@bmstu.ru; 4 evv@bmstu.ru; 5 ivakhnenko@bmstu.ru

Reduction of radiation defects in MIS structures using a multilayer resist based on a refractory metal

N.V. Cherkesova1, G.A. Mustafaev2, A.G. Mustafaev3

1,2 Kabardino-Balkarian State University, (Nalchik, Russia)
3 Dagestan State University of National Economy (Makhachkala, Russia)
1 natasha07_2002@mail.ru, 2 zoone@mail.ru, 3 arslan_mustafaev@mail.ru