М.Ю. Филатов

2013

1. Application of Plasma-Chemical Etching for pin Diode Technology Science Intensive Technologies, No. 11, 2013 pp. 57-60
2. The Effects of Exposure to Fast Electron Radiation on High-Frequency Si PIN diodes and Schottky Barrier Diodes Science Intensive Technologies, No. 11, 2013 pp. 51-56
3. Relevant Characteristics of Epitaxial Growth Technology of Microwave and RF PIN-Diodes at JSC «Optron» and its Perspectives Science Intensive Technologies, No. 11, 2013 pp. 22-29
4. New Clamping Si Diode Technology Integrated on a Heatsink Science Intensive Technologies, No. 11, 2013 pp. 19-21