Formation of nanostructured states in silumine at highly intensive electron treatment

The surface layer of silumine having the eutectoid composition was treated by a highly intensive electron beam plasma flows, and then examined by the methods of electron scanning and diffraction transmission microscopy, X-raying, micro-hardness indentation and wear resistivity measurements. There were discovered the modes of electron-plasma treatment allowing one to form submicro- and nanosized multiphase structure in the surface region, whose micro-hardness appears to be several times higher than that one of the initial material. The mode of combined treatment was discovered that makes it possible to ~ 9,5 times increase the silumine micro-hardness with the surface layer thickness of about 100 m. The hardening of the surface layer is shown to be caused by formation of the so-called grain-subgrain aluminum structure with crystallite size of about 80 - 100 nm and the second phase particles educing as well.