Article or book title, author's surname, DOI

Photoluminescence spectral features of mg-doped (Al)GaN epitaxial layers

A.V. Khoteeva1, D.R. Sabitov2, A.A. Marmalyuk3

research article UDC 621.315.592.3 Pages: 48-54 doi.org/10.18127/j22250980-202502-05

  1. 1,3 POLYUS Research Institute of M.F. Stelmakh (Moscow, Russia); Patrice Lumumba Peoples' Friendship University of Russia (Moscow, Russia)
  2. 2 POLYUS Research Institute of M.F. Stelmakh (Moscow, Russia)

Abstract

Doping of p-GaN epitaxial layers (EL) and p-AlxGa1-xN solid solutions with magnesium impurity is complicated by the self-compensation effect associated with the appearance of donor states in the bandgap at a certain concentration of introduced acceptor atoms. Based on the spectra obtained by the photoluminescence method, it is possible to track the appearance of self-compensation in (Al)GaN:Mg EL and establish the optimal consumption of the introduced magnesium impurity, which allows obtaining a relatively high concentration of the majority charge carriers.

Objective – Study of charge carrier concentration dependence in GaN:Mg and Al0.2Ga0.8N:Mg on Mg dopant flow rates, determination of optimal doping parameters, and investigation of photoluminescence spectral features in the obtained epitaxial structures.
Results: The photoluminescence spectra of GaN:Mg and Al0.2Ga0.8N:Mg samples with varying dopant flow rates were measured. Analysis of these photoluminescence spectra enables determination of optimal growth conditions for p-type (Al)GaN epitaxial structures that avoid self-compensation effects detrimental to charge carrier concentration.

Photoluminescence spectroscopy monitoring of self-compensation effects enables fabrication of high-quality p-(Al)GaN epitaxial structures suitable for optoelectronic device applications.

Received
24.01.2024
Approved after review
07.02.2024
Accepted
04.03.2024

How to cite

Хотеева А.В., Сабитов Д.Р., Мармалюк А.А. Особенности фотолюминесцентных спектров эпитаксиальных слоев (Al)GаN, легированных магнием // Нанотехнологии: разработка, применение – XXI век. 2025. Т. 17. № 2. С. 48–54. DOI: https://doi.org/ 10.18127/ j22250980-202502-05

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