Formation of textured thin 3D ferromagnetic metal films with different crystallographic orientation and microstructure by dc-sputtering
- 1 Researcher, Saratov branch of the Kotel-nikov Institute of Radio Engineering and Electronics Russian Academy of Sciences
- 2 Ph.D. (Phys.-Math.), Leading Researcher Scientist, Saratov branch of the Kotel-nikov Institute of Radio Engineering and Electronics Russian Academy of Sciences
- 3 Dr. Sc. (Phys.-Math.), Professor, Director, Saratov branch of the Kotel-nikov Institute of Radio Engineering and Electronics Russian Academy of Sciences
Abstract
Influence of gas pressure and substrate bias voltage on crystal structure, crystallographic orientation and microstructure of textured thin 3D ferromagnetic metal films produced by dc-sputtering at room temperature are investigated.
How to cite
Никулин Ю.В., Джумалиев А.С., Филимонов Ю.А. Формирование текстурированных пленок ферромагнитных 3D металлов с различной кристаллографической ориентацией и микроструктурным строением методом магнетронного распыления на постоянном токе // Нелинейный мир. 2014. № 2. С. 5–7.
References
- Yi J.B., Zhou Y.Z., Ding J. et al. An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering // JMMM. 2004. V. 284. P. 303.
