350 руб
Журнал «Нанотехнологии: разработка, применение - XXI век» №1 за 2009 г.
Статья в номере:
Применение кластерных ионов в нанотехнологии
Авторы:
А.А. Андреев, Ю.А. Ермаков, А.С. Патракеев, В.С. Черныш - ОАО «ТЕНЗОР», Москва, Россия, НИИЯФ МГУ, Москва, Россия. Физический факультет МГУ им. М.В. Ломоносова. E-mail: AAA@msk.org.ru; yuriermak@yandex.ru; patran@phys.msu.ru; chernysh@phys.msu.ru
Аннотация:
Рассмотрена история развития исследований, связанных с получением пучков газовых кластерных ионов. Обсуждены физические принципы формирования пучков газовых ионов. Рассмотрены свойства пучков кластерных ионов, и кратко описана аппаратура для исследования взаимодействия газовых кластерных ионов с поверхностью твердых тел. Представлен обзор исследований по распылению поверхности под действием бомбардировки кластерными ионами. Показано, что основные характеристики распыления кластерными ионами сильно отличаются от распыления ионами мономеров. Приведены примеры применения кластерных ионов для модификации свойств поверхности твердых тел и пленок. Обсужден новый метод имплантации материала на малые глубины, основанный на использовании газовых кластерных ионов. Продемонстрировано, что пучки кластерных ионов открывают новые перспективы в современных нанотехнологиях, связанных с полировкой поверхности материалов и нанесением тонких пленок
Страницы: 23-39
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