350 rub
Journal Science Intensive Technologies №11 for 2013 г.
Article in number:
Industrial Process Design of Microwave Transistors on Heteroepitaxial Gallium Nitride Structures at State Plant Pulsar
Keywords:
microwave electronics
wide bandgap semiconductor materials
nanodimensional heterostructures
Authors:
V.A. Burobin - Ph.D. (Eng.), General Director, GZ Pulsar. E-mail: burobin@gz-pulsar.ru, openline@gz-pulsar.ru
N.I. Kargin - Dr.Sc. (Eng.), Professor, Vice Principal on innovative development, National Research Nuclear University (NRNU MEPHI). E-mail: krgn@ya.ru
А.М. Konovalov - Senior Specialist, GZ Pulsar. E-mail: kb-it@mail.ru
А.А. Makarov - Processing Engineer, GZ Pulsar. E-mail: makarov.pulsar@gmail.com
M.V. Pashkov - Processing Engineer, GZ Pulsar. E-mail: michaelpashkov@yandex.ru
R.I. Tychkin - Deputy Chief Engineer, GZ Pulsar
N.I. Kargin - Dr.Sc. (Eng.), Professor, Vice Principal on innovative development, National Research Nuclear University (NRNU MEPHI). E-mail: krgn@ya.ru
А.М. Konovalov - Senior Specialist, GZ Pulsar. E-mail: kb-it@mail.ru
А.А. Makarov - Processing Engineer, GZ Pulsar. E-mail: makarov.pulsar@gmail.com
M.V. Pashkov - Processing Engineer, GZ Pulsar. E-mail: michaelpashkov@yandex.ru
R.I. Tychkin - Deputy Chief Engineer, GZ Pulsar
Abstract:
An innovative research on advanced industrial technology design of the microwave power transistors on AlGaN/GaN heterostructures was performed. The prospects of developing an electronic component base using the wide-gap semiconductor materials are discussed. The important issues of material choice for substrates as well as technological aspects of heteroepitaxial structures formation are reviewed in this article. An up-to-date full-cycle processing line for AlGaN/GaN power microwave transistors is introduced. Volt-ampere characteristics of fabricated transistor chip and multi-stage transistor devices are presented. A flip-chip mounting approach is suggested to solve the thermal resistance problem.
Pages: 30-36
References
- Burobin V. A. Novoe pokolenie e'lektronnoj texniki: Perspektivy' razvitiya priborov silovoj e'lektroniki na osnove nitrida galliya // Texnopolis XXI. Sentyabr' 2012. S. 18-19.
- Burobin V. A. Razrabotka konstrukczii i promy'shlennoj texnologii izgotovleniya moshhnogo SVCh tranzistora na baze geteroe'pitaksial'noj struktury' AlGaN/GaN // Oboronny'j kompleks ? nauchno-texnicheskomu progressu Rossii. 2012. №4. S. 66-71.