Journal Radioengineering №5 for 2017 г.
Article in number:
Investigation of localized states in barrier structures of electronic elements based on amorphous hydrogenized silicon
Type of article: scientific article
UDC: 621.315.592
Authors:

S.P. Vikhrov – Dr. Sc. (Phys.-Math.), Professor, Department «Micro- and Nanoelectronics», Ryazan State Radio Engineering University

E-mail: vikhrovsergey@mail.ru

N.V. Vishnyakov – Ph. D. (Eng.), Associate Professor, Department «Micro- and Nanoelectronics», Ryazan State Radio Engineering University

E-mail: rcpm-rgrtu@yandex.ru

V.V. Gudzev – Ph. D. (Phys.-Math.), Associate Professor, Department «Micro- and Nanoelectronics», Ryazan State Radio Engineering University

E-mail: valerygudzev@yandex.ru

V.G. Litvinov – Ph. D. (Phys.-Math.), Associate Professor, Department «Micro- and Nanoelectronics», Ryazan State Radio Engineering University

E-mail: vglit@yandex.ru

V.G. Mishustin – Ph. D. (Phys.-Math.), Associate Professor, Department «Micro- and Nanoelectronics», Ryazan State Radio Engineering University

E-mail: vgmish@yandex.ru

Abstract:

Possibilities of current deep level transient spectroscopy and method of current compensation of non-stationary photoconductivity for the investigation of localized states in mobility gap of amorphous hydrogenizes silicon are reviewed. The possibility of their combined use as express method for parameters control of device structures based on non-crystalline semiconductors is shown.

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Date of receipt: 17 апреля 2017 г.