V.Ya. Shanigin, R.K. Yafarov

It is established that after plasma micromachining in freon superficial density it is less, than after processing in argon, and they increase with temperature growth for freon and decreases for argon. It is shown that such nature of dependences testifies to existence of a precursor chemisorptions and is caused by various power of adsorption of carbon on the plates of the silicon which have passed preliminary micromachining in various chemically active environments.