H.R. Sagatelyan – 

Dr. Sc. (Eng.), Professor, Bauman Moscow State Technical University 

E-mail: h_sagatelyan@mail.ru

I.Yu. Grachev –

Student, Bauman Moscow State Technical University 

E-mail: soweo8@gmail.com

K.N. Bugorkov – 

Deputy Head of Technological Department, V.I. Kuznetsov Research Institute of Applied Mechanics

E-mail: Milan85@yandex.ru

N.V. Fedorkova – 

Ph.D. (Eng.), Associate Professor, Bauman Moscow State Technical University

E-mail: k_rl6@bmstu.ru

Statement of the problem. Plasma-chemical etching (PCE) is one of the key nanotechnological operations in microelectronics. PCE are also used in the manufacture of diffraction optics parts. The most effective from a technological point of view is inductively coupled plasma, which provides the highest plasma density. However, the depth distribution of the formed relief turns out to be uneven over the entire area of the treated surface. Obviously, this is due to the uneven distribution of charged particles. However, to date, insufficient attention has been paid to the analytical consideration of the distribution of the electromagnetic field in the volume of the vacuum chamber.

Aim of the work. Development of a method for calculating the distribution of magnetic induction and electric intensity of the electromagnetic field created in the cavity of a vacuum chamber by a flat inductor in the form of a spiral antenna.

Results. Procedure was developed for calculating the distribution of magnetic induction and electric intensity of the electromagnetic field created in a high-frequency discharge plasma by a flat spiral antenna. Magnetic induction is calculated based on the application of the Biot-Savart-Laplace law for a closed loop with current. The number of closed turns is taken equal to the number of spiral turns of the antenna in compliance with the dimensions of the antenna and the pitch of the turns. The electric field strength is calculated based on the application of the Faraday law of electromagnetic induction (the third Maxwell equation, written in the integral form). Spatial plots of the distribution of magnetic induction and electric intensity are obtained for the cases of one turn, two turns, and any predetermined number of turns.

Practical significance. The proposed model and the developed calculation method can be used both in the design of new plasmachemical etching plants to ensure increased uniformity in the distribution of the characteristics of the electromagnetic field in the required area of the vacuum chamber, and in the design of technological equipment for the use of PCE installations of existing designs with the highest efficiency of group or individual processing of workpieces.

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