V.N. Zima - Ph.D. (Eng.), Leading Research Scientist, PJSC «ONIIP». E-mail: info@oniip.ru
T.N. Tanskaya - Junior Research Scientist, PJSC «ONIIP». E-mail: info@oniip.ru

This paper presents the research results of the dependence of mechanical stresses (σ) and the surface roughness of the molybdenum films on preparation conditions of magnetron sputtering. The molybdenum thin films of thicknesses 0,2-0,75 microns were formed on substrates of glass-ceramic. The conducted investigations indicate that Mo films have compressive mechanical stresses. Their value did not exceed -1 GPa at different parameters of magnetron sputtering. Minimal mechanical stresses were in the Mo films prepared at substrate temperatures of 440-480K, the power density of ≥ 7 W/cm2 and a pressure of argon in the vacuum chamber 0,2-0,26 Pa. The surface roughness of the Mo films was investigated by atomic force microscopy and was evaluated by the standard deviation (Sq). It was established that the standard deviation for Mo films is less than 2 nm. The obtained results will be useful for development of thin-film BAW microwave resonators with Bragg reflector.

1. Shen Y.G. Effect of deposition conditions on mechanical stresses and microstructure of sputter-deposited molybdenum and reactively sputter deposited molybdenum nitride films // Mater. Sci. Eng. A. Oct. 2003. V. 359. № 1. P. 158-167.
2. Khatri H., Marsillac S. Effect of deposition parameters on r.f. sputtered molybdenum thin films // J. Phys. Condens. Mater. Jan. 2008. V. 20. № 5. P. 055206.
3. Tralshawala N., Brekosky R.P., Li M.J., Figueroa-Feliciano E., Finkbeiner F.M., Lindeman M.A., Stahle C.M., Stahle C.K. Fabrication of Mo/Au transition-edge sensors for X-ray spectrometry // IEEE Trans. Appl. Supercond. Mar. 2001. V. 11. № 1. P. 755-758.
4. Fabrega L., Fernandez-Martinez I., Parra-Borderias M., Gil O., Camon A., Gonzalez-Arrabal R., Sese J., Santiso J., Costa-Kramer J.-L., Briones F. Effect of stress and morphology on the resistivity and critical temperature of room-temperature-sputtered Mo thin films // IEEE Trans. Appl. Supercond. Dec. 2008. V. 19. № 6. P. 3779-3785.
5. Oikawa H., Nakajima Y. Effect of heat treatment after deposition on internal stress in molybdenum films on SiO2/Si substrates // J. Vac. Sci. Technol. 1977. V. 14. № 5. P. 1153-1156.
6. Kajno G. Akusticheskie volny: Ustrojstva, vizualizaciya i analogovaya obrabotka signalov: Per. s angl. M.: Mir. 1990.
7. Cyung C.J., Chen Y.C., Cheng C.C., Wei C.L., Kao K.S. Influence of Surface Roughness of Bragg Reflectors on Resonance Characteristics of Solidly-Mounted Resonators // IEEE Transactions on Ultrasonics, Ferroelectrics and Frequency Control. 2007. V. 54. № 4. P. 802-807.
8. Stoney G.G. The Tension of Metallic Films Deposited by Electrolysis // Proc. R. Soc. Lond. A. 1909. № 82. P. 172-175.
9. Raskatov V.M., CHuenkov V.S., Bessonova N.F., Vejs D.A. Mashinostroitel'nye materialy: Kratkij spravochnik. M.: Mashinostroenie. 1980.
10. Hass G., Tun R.EH. Fizika tonkih plenok. Sovremennoe sostoyanie issledovanij i tekhnicheskie primeneniya / Per. s angl. M.: Mir. 1968. T. 3.