Article or book title, author's surname, DOI

Growth feature of ionic nitrogen doped A-C:NX films obtain by pulse cathode arc discharge

D.G. Piliptsov1, A.S. Rudenkov2, A.V. Rogachev3, Xiao Hong Jiang4, P.A. Luchnikov5, V.A. Emel-yanov6

research article Pages: 35-42

  1. 1,2 Ph.D. (Eng.), Senior Research Scientist, International Chinese-Belarusian Scientific Laboratory on Vacuum-Plasma Technology, Francisk Skorina Gomel State University
  2. 3 Dr.Sc. (Chem.), Professor, International Chinese-Belarusian Scientific Laboratory on Vacuum-Plasma Technology, Francisk Skorina Gomel State University
  3. 4 Ph.D. (Eng.), Professor, nternational Chinese-Belarusian Scientific Laboratory on Vacuum-Plasma Technology, Nanjing University of Science and Technology
  4. 5 Senior Research Scientist, Moscow Technological University
  5. 6 Dr.Sc. (Eng.), Professor, Joint Stock Company «Integral» (Minsk, Belarus)

Abstract

It was found change of the properties, phase composition and mechanical properties of the carbon coating, subjected to ion nitriding. It is shown that ion nitriding is in the surface layers of increasing the share of sp2-phase with a decrease in the size of the clusters. It was found that the ion nitriding of carbon coatings are formed CNx connections to increase the number of the type of N-Csp2 bonds.

How to cite

Пилипцов Д.Г., Руденков А.С., Рогачев А.В., Джанг С.Х., Лучников П.А., Емельянов В.А. Особенности роста углеродных покрытий в импульсном катодно-дуговом разряде при легировании ионами азота // Наноматериалы и наноструктуры - XXI век. 2016. № 3. С. 35–42.

References

 

  1. Majumdar A., Das S.C., Bogdanowicz R., Shripathi T., Langel W. Rainer Hippler, Role of nitrogen in evolution of sp2/sp3 bonding and optical band gap in hydrogenated carbon nitride // Vibrational Spectroscopy. 2013. V. 66. R. 63-68.
  2. Liu D.G., Tu J.P., Zhang H., Chen R., Gu C.D. Microstructure and mechanical properties of carbon nitride multilayer films deposited by DC magnetron sputtering. // Surf. Coat. Technol. 2011. V. 205. R. 3080-3086.
  3. Chen R., Tu J.P., Liu D.G., Yu Y.L., Qu S.X., Gu C.D. Structural and mechanical properties of TaN/a-CNx multilayer films //Surf. Coat. Technol. 2012. V. 206. R. 2242-2248.
  4. Voevodin A.A. Comparative study of wear-resistant DLC and fullerene-like CNxfilmsproduced by pulsed laser and filtered cathodic arc depositions // Surface &Films Technology. 2005. V. 197. P. 116-125.
  5. Broitman E. Mechanical and tribological properties of CNx films deposited by reactive magnetron sputtering // Wear. 2001. V. 248.P. 55-64.
  6. Liu A.Y., Cohen M.L.Prediction of new low compressibility solids // Science. 1989. V. 245. P. 841-842.
  7. Cohen M.L. Structural, electronic and optical properties of carbon nitride // Material Science Engineering A. 1995. V. 209. P. 1-4.
  8. Neidhardt J. Growth of fullerene-like carbon nitride thin solid films by reactive magnetron sputtering; role of low-energy ion irradiation in determining microstructure and mechanical properties // J. Appl. Phys. 2003. V. 93. P. 3002‒3014.
  9. Hellgren N. Role of nitrogen in the formation of hard and elastic CNx thin films by reactive magnetron sputtering // Phys. Rev. B. 1999. V. 59. P. 5162‒5169.
  10. Gammon W.J. Experimental comparison of N(1s) X-ray photoelectron spectroscopy binding energies of hard and elastic amorphous carbon nitride films with reference organic compounds //Sarbon. 2003. V. 41. P. 1917-1923.