The Measurement of Multilayered Magnetodielectric Structure Parameters by the Method of Inverse Problem Solution

The destructive and noninvasive methods of simultaneous permittivities and permeabilities test and measuring have been considered in this paper for of flat multilayered structure using the inverse problem solutions. The review of published papers and the original author-s results are presented in this work. The cavity resonator methods and the pulse location methods are not presented here.

The analytical correlations and algorithms have been considered for destructive measuring methods (method of line) both for the matched load and short circuit regimes in the rectangular waveguide and coaxial line.

The principal matter of paper is the direct and inverse problems solutions for the waveguide and coaxial probe structures (the open and shielded). The methods of such solutions are based on the previous author-s works and are in a good accuracy with similar results of other publications. The simulation results for probe multilayered structure modeling, for volume cavity plasma, for metallic and semiconductor plasmic nanofilms on dielectric substrate in the rectangular waveguide probe structure have been presented. This results show the possibility of sufficiently precise diagnostics and test of considered structures including the measurement of nanostructure thickness.

The inverse problem statements are based on the least-square minimization of mean-square discrepancy between the experimental and theoretical results, on the method of artificial neuron networks, and on the regression models and approximating formulas. The test results for inverse problem solution are obtained using three different approaches. The errors of such solutions and the ways and methods of its reduction and accuracy enhancement are discussed in the paper. Particularly, the method of corrective four-port (error four-port) in combination with the method of multilevel calibrations is considered.