A.E. Anurov

А.Е. Ануров

1 articles 2011

Наноматериалы и наноструктуры - XXI век 1

2011

Influence of process variable on properties of silicon nitride nano-thick films, deposited in inductively coupled plasma Наноматериалы и наноструктуры - XXI век, No. 4, 2011 pp. 43-47