N.V. Cherkesova

2025

1. Effect of ion implantation and hot electrons on the threshold voltage of MOSFETs Electromagnetic Waves and Electronic Systems, No. 6, 2025 pp. 78-83
2. Reduction of radiation defects in MIS structures using a multilayer resist based on a refractory metal Nanotechnology : the development , application - XXI Century, No. 4, 2025 pp. 46-50
3. Low-temperature technology for the formation of interconnections and contacts using ion beams Science Intensive Technologies, No. 1, 2025 pp. 24-28