350 rub
Journal Nonlinear World №1 for 2011 г.
Article in number:
Influence of annealing temperature on domain structure and microstructure of polycrystall Ni/SiO2/Si films
Authors:
Y.V. Nikulin, A.S. Dzhumaliev, Y.A. Filimonov
Abstract:
The influence of annealing temperature on crystallinity, domain structure, surface morphology and magnetization process of Ni films were studied.
Pages: 13-14
References
  1. Yi J.B., Zhou Y.Z., Ding J., et. al.An investigation of structure, magnetic properties and magnetoresistance of Ni films prepared by sputtering // JMMM. 2004. V. 284. P. 303.
  2. Zhong W.H., Chang Q.S., et.al. Size effect on the magnetism of nanocrysctalline Ni films at ambient temperature // Solid State Communications. 2004. V. 130. P. 603.
  3. Технология тонких пленок. Справочник / под ред. Л. Майссела, Р. Глэнга. М.: Советское радио. 1977. С. 572.
  4. Kohmoto O., Mineji N., et.al. Perpendicular anisotropy of sputtered Ni films // JMMM. 2002. V. 239. P.36