350 rub
Journal Nonlinear World №1 for 2011 г.
Article in number:
Single layer natural graphite etching conditions optimization in plasma processing reactor based on beam-plasma discharge
Keywords: graphene FLG plasma processing reactor beam-plasma discharge
Authors:
V.V. Peskov, Yu.I. Latyshev, E.G. Shustin
Abstract:
The possibility of nanoscale graphite layers obtaining via thin graphite single crystal low energy etching has been shown. The etching conditions optimization has been made. FLG films both with perfect structure and area greater than 100*100 µm2 has been obtained.
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