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Influence of the structure of nanostructured thin films of carbon materials and nitrides of metals (TiN, ZrN, AlN) on mechanical characteristics of layer structures


S.A. Nalimov – Senior Research Scientist, Central Research Technological Institute «Technomash» (Moscow)
S.A. Bagdasaryan – Ph.D.(Eng.), General Director, JSC «Scientific Engineering Center «Technological Developments of Telecommunication and Radio Frequency Identification» (Moscow)
A.I. Yurin – Ph.D.(Eng.), Associate Professor, HSE Tikhonov Moscow Institute of Electronics and Mathematics
V.V. Borisov – Leading Programmer, Skobeltsyn Institute of Nuclear Physics of Lomonosov Moscow State University

The influence of formation conditions on the composition and structure films of diamond, diamond-like carbon and metal nitrides (TiN, ZrN and AlN) is considered. The diamond films were grown from a gas mixture of hydrogen and methane, activated by an arc discharge. Diamond-like carbon films were obtained by RF magnetron sputtering, a diode RF discharge in a gas mixture of cyclohexane and hydrogen and sputtering of graphite by an ion beam. Films of metal nitrides were obtained by arc discharge and methods of RF and DC of magnetron reactive sputtering. The interrelation of the composition and structure of the synthesized films with the mechanical properties of layered structures based on them was studied. Tests have shown that microcircuits with a protective coating based on AlN are operable under conditions of impact and abrasive loads at temperatures up to 600 K.

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