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Superficial structuring crystals of silicon as method of improvement of their field emission properties

Keywords:

V.Ya. Shanygin - Ph.D. (Eng.), Research Scientist, V.A. Kotel'nikov IRE RAS (Saratov branch)
E-mail: vitairerun@mail.ru
R.K. Yafarov – Dr.Sc. (Eng.), Нead of Laboratory, V.A. Kotel'nikov IRE RAS (Saratov branch)
D.V. Nefedov – Ph.D. (Eng.), Research Scientist, V.A. Kotel'nikov IRE RAS (Saratov branch)


It is shown that preliminary plasma processing of silicon plates before sedimentation of carbon mask coverings and optimization of duration of mask etching are represented by perspective methods of improvement of their field emission properties.

References:
  1. Guljaev Ju.V., Aban'shin N.P., Gorfinkel' B.I., Morev S.P., Rezchikov A.F., Sinicyn N.I., Jakunin A.N. // Pis'ma v ZhTF. 2013. T.39. V. 11. S. 63.
  2. Jafarov R.K. Fizika SVCh vakuumno-plazmennyh nanotehnologij. M.: Fizmatlit. 2009.

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